DocumentCode :
2516634
Title :
Influence of a Tunneling Gate Current on the noise performance of SOI MOSFETs
Author :
Pailloncy, G. ; Iniguez, B. ; Dambrine, G. ; Danneville, F.
Author_Institution :
IEMN, CNRS, Villeneuve d´´Ascq, France
fYear :
2004
fDate :
4-7 Oct. 2004
Firstpage :
55
Lastpage :
57
Abstract :
In this paper, the RF noise properties of fully depleted (FD) SOI MOSFETs in the presence of a tunneling gate current (TGC) are described using a physical compact noise modeling. A complete noise model is first proposed to account for the presence of TGC. Its influence on the RF noise performance of FD SOI performance is then presented and it is shown that both the minimum noise figure and the optimum noise match conditions are affected in the sub-10 GHz frequency range, for TGC densities higher than 5 A/cm2.
Keywords :
MOSFET; elemental semiconductors; microwave field effect transistors; semiconductor device models; semiconductor device noise; silicon-on-insulator; tunnelling; 10 GHz; RF noise properties; Si; fully depleted SOI MOSFET; noise figure; noise modeling; tunneling gate current; Circuit noise; FETs; Hydrodynamics; Integrated circuit noise; Leakage current; MOSFETs; Noise figure; Noise measurement; Radio frequency; Tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SOI Conference, 2004. Proceedings. 2004 IEEE International
Print_ISBN :
0-7803-8497-0
Type :
conf
DOI :
10.1109/SOI.2004.1391553
Filename :
1391553
Link To Document :
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