DocumentCode :
2517664
Title :
Strain engineered In/sub x/Ga/sub 1-x/As channel pHEMTs on virtual substrates: a simulation study
Author :
Babiker, S. ; Asenov, A. ; Roy, S. ; Barker, J.R. ; Beaumont, S.P.
Author_Institution :
Dept. of Electron. & Electr. Eng., Glasgow Univ., UK
fYear :
1998
fDate :
19-21 Oct. 1998
Firstpage :
178
Lastpage :
181
Abstract :
The impact of In/sub x/Al/sub 1-x/As strain control buffers on the performance of low In content InGaAs channel pseudomorphic high electron mobility transistor p(HEMT) is investigated. It is shown that relaxed and tensile strained channel devices outperform the conventional compressively strained channel devices. It is argued that strain engineering in GaAs based devices makes it possible to realise RF characteristics comparable to InP based pHEMTs while obtaining improved breakdown characteristics.
Keywords :
III-V semiconductors; electric breakdown; gallium arsenide; high electron mobility transistors; indium compounds; semiconductor device models; In content; InGaAs-InAlAs; RF characteristics; breakdown characteristics; channel pHEMTs; strain control buffers; strain engineering; tensile strained channel devices; virtual substrates; Capacitive sensors; Electron mobility; Gallium arsenide; HEMTs; Indium gallium arsenide; Indium phosphide; MODFETs; PHEMTs; Radio frequency; Strain control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Computational Electronics, 1998. IWCE-6. Extended Abstracts of 1998 Sixth International Workshop on
Conference_Location :
Osaka, Japan
Print_ISBN :
0-7803-4369-7
Type :
conf
DOI :
10.1109/IWCE.1998.742741
Filename :
742741
Link To Document :
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