Pull-in voltage measurements of torsional micromirror arrays for uniformity characterization

Author

Jang, Yun-Ho ; Lee, Kook-Nyung ; Yoo, Byung-Wook ; Kim, Yong-Kweon

Author_Institution

Image Dev. Team, Samsung Electron.

fYear

2005

fDate

1-4 Aug. 2005

Firstpage

39

Lastpage

40

Abstract

In this paper, we describe pull-in voltage measurement technique and results for the uniformity characterization of torsional micromirror arrays (MMAs). A simple measurement scheme using two illuminators and image processing was implemented. The MMAs were fabricated using two kinds of substrate; silicon on glass (SiOG) and silicon on insulator (SOI) wafers. Pull-in voltage distributions are presented, and the differences of two substrates on pull-in voltage distributions are compared

Keywords

glass; image processing; micromirrors; optical arrays; optical fabrication; silicon-on-insulator; voltage measurement; illuminator; image processing; pull-in voltage distribution; pull-in voltage measurement technique; silicon on glass; silicon on insulator wafers; torsional micromirror arrays fabrication; uniformity characterization; Crystallization; Electrodes; Fabrication; Glass; Micromirrors; Mirrors; Silicon on insulator technology; Springs; Time measurement; Voltage measurement;

fLanguage

English

Publisher

ieee

Conference_Titel

Optical MEMS and Their Applications Conference, 2005. IEEE/LEOS International Conference on

Conference_Location

Oulu

Print_ISBN

0-7803-9278-7

Type

conf

DOI

10.1109/OMEMS.2005.1540065

Filename

1540065