DocumentCode :
2518173
Title :
Free-space MEMS tunable optical filter on [110] silicon
Author :
Lipson, A. ; Yeatman, Eric M.
fYear :
2005
fDate :
1-4 Aug. 2005
Firstpage :
73
Lastpage :
74
Abstract :
Tunable optical filters (TOFs) are key components in optical communication WDM networks. In this paper we have successfully demonstrated two-Bragg mirror Fabry-Perot MEMS tunable optical filter fabrication by a combination of KOH and deep reactive ion etching in (110) silicon
Keywords :
micromirrors; optical communication equipment; optical fabrication; optical filters; optical tuning; silicon; sputter etching; wavelength division multiplexing; KOH etching; Si; WDM networks; deep reactive ion etching; free-space MEMS tunable optical filter; optical communication; silicon; two-Bragg mirror Fabry-Perot filter fabrication; Micromechanical devices; Mirrors; Optical fiber devices; Optical fiber testing; Optical filters; Optical losses; Optical tuning; Silicon; WDM networks; Wet etching;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optical MEMS and Their Applications Conference, 2005. IEEE/LEOS International Conference on
Conference_Location :
Oulu
Print_ISBN :
0-7803-9278-7
Type :
conf
DOI :
10.1109/OMEMS.2005.1540083
Filename :
1540083
Link To Document :
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