DocumentCode :
2518342
Title :
The influence of the growth temperature on the doping characteristics of P-GaP layers in AlGaInP red LED
Author :
Luo, Shaojun ; Deng, Jun ; Li, Jianjun ; Gao, Linchun ; Chen, Rui ; Han, Jun
Author_Institution :
Key Lab. of Opto-Electron. Technol., Beijing Univ. of Technol., Beijing, China
fYear :
2010
fDate :
3-6 Dec. 2010
Firstpage :
1
Lastpage :
4
Abstract :
The doping characteristics of P-GaP layer in AlGaInP red LED has been studied, by changing the low pressure metal organic chemical vapor deposition (LP-MOCVD) system´s growth temperature. Several epitaxial samples, which grown at different temperatures of LP-MOCVD, have been tested by ECV system. The results have been shown,that the doping density and the surface of GaP layer and the characteristics of the LED changed with the growth temperature of GaP layers. This experience can be used for the fabrication of high-performance AlGaInP red LED.
Keywords :
III-V semiconductors; MOCVD; aluminium compounds; doping profiles; gallium compounds; indium compounds; light emitting diodes; phosphorus; semiconductor doping; semiconductor epitaxial layers; semiconductor growth; vapour phase epitaxial growth; AlGaInP:GaP-P; ECV system; doping density; epitaxial grown; growth temperature; low pressure metal organic chemical vapor deposition; red LED; Doping; Light emitting diodes; Ohmic contacts; Substrates; Surface morphology; Temperature distribution; ECV; LED; MOCVD; P-GaP;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advances in Optoelectronics and Micro/Nano-Optics (AOM), 2010 OSA-IEEE-COS
Conference_Location :
Guangzhou
Print_ISBN :
978-1-4244-8393-8
Electronic_ISBN :
978-1-4244-8392-1
Type :
conf
DOI :
10.1109/AOM.2010.5713514
Filename :
5713514
Link To Document :
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