DocumentCode :
2518691
Title :
Theoretical investigation on influence of semiconductor substrate on transmission performance of epitaxially grown Fabry-Pérot filter
Author :
Wang, Wei ; Huang, Yongqing ; Duan, Xiaofeng ; Guo, Jingwei ; Huang, Hui ; Ren, Xiaomin ; Cai, Shiwei
Author_Institution :
Key Lab. of Inf. Photonics & Opt. Commun., Beijing Univ. of Posts & Telecommun., Beijing, China
fYear :
2010
fDate :
3-6 Dec. 2010
Firstpage :
1
Lastpage :
4
Abstract :
This paper investigates the influence of the GaAs substrate on the transmission performance of quarter-wave-stacks´ Distributed Brag Reflector (DBR)-based Fabry-Pérot (F-P) filter formed by heteroepitaxial growth, using Transfer Matrix Method (TMM) theoretically. According to our simulation, the designed resonant transmission peak of the filter deteriorates by splitting up with the substrate thickness increasing; furthermore, a rapid oscillation of the Peak-Transmittivity (P-T) of the filter along with the alteration of the substrate thickness is also gained. Finally, a conclusion is achieved that a relatively acceptable transmission spectrum of the filter of this kind can be obtained by thinning the substrate down to a suitable thickness range through well-controlled grinding and polishing.
Keywords :
Fabry-Perot interferometers; III-V semiconductors; aluminium compounds; distributed Bragg reflectors; gallium arsenide; grinding; integrated optics; optical filters; optical materials; optical retarders; polishing; semiconductor epitaxial layers; semiconductor growth; substrates; GaAs; GaAs-AlGaAs; distributed Brag reflector; epitaxially grown Fabry-Perot filter; grinding; heteroepitaxial growth; peak-transmittivity oscillation; polishing; quarter wave stacks; resonant transmission peak; semiconductor substrate; substrate thickness; transmission performance; Cavity resonators; Distributed Bragg reflectors; Filtering theory; Gallium arsenide; Optical filters; Oscillators; Substrates; Fabry-Pérot Filter; Transfer Matrix Method(TMM); substrate; transmission performance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advances in Optoelectronics and Micro/Nano-Optics (AOM), 2010 OSA-IEEE-COS
Conference_Location :
Guangzhou
Print_ISBN :
978-1-4244-8393-8
Electronic_ISBN :
978-1-4244-8392-1
Type :
conf
DOI :
10.1109/AOM.2010.5713535
Filename :
5713535
Link To Document :
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