DocumentCode :
2518738
Title :
A novel technique for the direct determination of carrier diffusion lengths in GaAs/AlGaAs heterostructures using cathodoluminescence
Author :
Sercel, P.C. ; Zarem, H.A. ; Lebens, J.A. ; Eng, L.E. ; Yariv, A. ; Vahala, K.J.
Author_Institution :
Dept. of Appl. Phys., California Inst. of Technol., Pasadena, CA, USA
fYear :
1989
fDate :
3-6 Dec. 1989
Firstpage :
285
Lastpage :
288
Abstract :
A novel technique for determining carrier diffusion lengths in direct gap semiconductors by cathodoluminescence measurement is presented. Ambipolar diffusion lengths are determined for GaAs quantum-well material, bulk GaAs, and Al/sub x/Ga/sub 1-x/As with x up to 0.38. A large increase in the diffusion length is found as x approaches 0.38 and is attributed to an order-of-magnitude increase in lifetime.<>
Keywords :
III-V semiconductors; aluminium compounds; carrier lifetime; gallium arsenide; luminescence of solids; semiconductor junctions; Al/sub x/Ga/sub 1-x/As; GaAs quantum-well material; GaAs-AlGaAs heterostructures; ambipolar diffusion lengths; bulk GaAs; cathodoluminescence; direct determination of carrier diffusion lengths; direct gap semiconductors; novel technique; order-of-magnitude increase in lifetime; semiconductors; Aluminum; Electron beams; Gallium arsenide; HEMTs; Length measurement; Luminescence; Optical fibers; Optical materials; Physics; Scanning electron microscopy;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1989. IEDM '89. Technical Digest., International
Conference_Location :
Washington, DC, USA
ISSN :
0163-1918
Print_ISBN :
0-7803-0817-4
Type :
conf
DOI :
10.1109/IEDM.1989.74280
Filename :
74280
Link To Document :
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