Title :
Influence of duty cycle on near-field diffraction of high-density gratings
Author :
Hu, Anduo ; Zhou, Changhe ; Wang, Shaoqing ; Ma, Jianyong ; Jia, Wei
Author_Institution :
Shanghai Inst. of Opt. & Fine Mech., Chinese Acad. of Sci., Shanghai, China
Abstract :
Near-field intensity distributions of high-density amplitude gratings with period d=2.3λ and different duty cycles illuminated by TE and TM polarized waves are simulated by using the finite-difference time-domain method. Numerical results show that intensity distributions of in the grooves change differently when duty cycle varies for TE and TM polarizations. As duty cycle increases, peak intensity in the middle of the first bright stripes and its locations change obviously. The main reason of location variation of the first bright stripes is the variation of the phase difference between the ±2nd orders and the 0th order, which is verified by using rigorous coupled-wave analysis. The investigation of influence of duty cycle on near-field diffraction of high-density gratings should be helpful for practical applications of high-density gratings.
Keywords :
diffraction gratings; finite difference time-domain analysis; light diffraction; light polarisation; TE polarized waves; TM polarized waves; duty cycle; finite-difference time-domain method; high-density gratings; near-field diffraction; near-field intensity distributions; phase difference; rigorous coupled-wave analysis; Diffraction; Diffraction gratings; Finite difference methods; Gratings; Image reconstruction; Optimized production technology; Time domain analysis; component; diffraction optics; duty cycle; high-density gratings; near-field diffraction;
Conference_Titel :
Advances in Optoelectronics and Micro/Nano-Optics (AOM), 2010 OSA-IEEE-COS
Conference_Location :
Guangzhou
Print_ISBN :
978-1-4244-8393-8
Electronic_ISBN :
978-1-4244-8392-1
DOI :
10.1109/AOM.2010.5713563