DocumentCode
2519259
Title
A Viable NDRO FERRAM Dielectric Structure
Author
Lampe, D.R. ; Dzimianski, J.W. ; Adams, D.A. ; Buhay, H. ; Sinharoy, S. ; Francombe, M.H.
Author_Institution
Westinghouse Advanced Technology Division
fYear
1993
fDate
22-24 Jun 1993
Firstpage
43
Lastpage
43
Keywords
Breakdown voltage; Chemical processes; Dielectric breakdown; Dielectric devices; Dielectrics and electrical insulation; FETs; Ferroelectric films; Ferroelectric materials; Silicon; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
Nonvolatile Memory Technology Review, 1993
Print_ISBN
0-7803-1290-2
Type
conf
DOI
10.1109/NVMT.1993.696947
Filename
696947
Link To Document