Title :
Stress mapping sensors for high power adaptive microoptics
Author :
Zamali, Mohd Suffian B ; Talghader, Joseph J.
Author_Institution :
Dept. of Electr. & Comput. Eng., Minnesota Univ., Minneapolis, MN
Abstract :
Directional stress and temperature effects are simultaneously measured and decoupled in micromachined membrane mirrors using a group of three ion implanted silicon resistors with different orientations. In a demonstration mirror, the sensors show compressive thermal stress changes of about -0.5plusmn0.08 MPa/degC and -0.66plusmn0.09 MPa/degC in the x and y-direction respectively
Keywords :
adaptive optics; ion implantation; micromirrors; silicon; stress measurement; temperature measurement; thermal stresses; Si; adaptive microoptics; compressive thermal stress; ion implanted silicon resistor; micromachined membrane mirror; stress mapping sensor; stress measurement; temperature measurement; Biomembranes; Compressive stress; Microoptics; Mirrors; Resistors; Silicon; Stress measurement; Temperature sensors; Thermal sensors; Thermal stresses;
Conference_Titel :
Optical MEMS and Their Applications Conference, 2005. IEEE/LEOS International Conference on
Conference_Location :
Oulu
Print_ISBN :
0-7803-9278-7
DOI :
10.1109/OMEMS.2005.1540142
