DocumentCode :
2519301
Title :
Micro Channel Vapor Chamber for high heat Spreading
Author :
Horiuchi, Yasuhiro ; Mochizuki, Masataka ; Mashiko, Koichi ; Saito, Yuji ; Kiyooka, Fumitoshi ; Cabusao, Gerald ; Nguyen, Thang
Author_Institution :
Fujikura Ltd., Tokyo, Japan
fYear :
2008
fDate :
9-12 Dec. 2008
Firstpage :
749
Lastpage :
754
Abstract :
The cooling technology that is most widely used for computers is air-cooling, because this is a mature technology with the least operation and maintenance cost. In order to push the limit of the air-cooling capability, enhancement of heat transfer from the processor to cooling medium is needed. Recently, the processor has multi-cores such as dual-cores, quad-cores. So, the heat dissipation from the processor surface is not uniform. For effective cooling, it is required least temperature gradient between the heat source and radiating componets. The well-known devices for effective heat transfer or heat spreading with the lowest thermal resistance are heat pipes and vapor chambers, which are two-phase heat transfer devices with excellent heat spreading ad heat transfer characteristics. In this paper, various designs using vapor chamber for CPU (Central Processor Unit) are presented with advanced technology of micro channel wick structure instead of traditional sintered powder wick.
Keywords :
cooling; microchannel flow; microcomputers; CPU; central processor unit; cooling technology; heat transfer; high heat spreading; micro channel vapor chamber; two-phase heat transfer devices; Circuits; Conducting materials; Containers; Cooling; Heat sinks; Heat transfer; Powders; Temperature; Thermal conductivity; Thermal resistance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics Packaging Technology Conference, 2008. EPTC 2008. 10th
Conference_Location :
Singapore
Print_ISBN :
978-1-4244-2117-6
Electronic_ISBN :
978-1-4244-2118-3
Type :
conf
DOI :
10.1109/EPTC.2008.4763522
Filename :
4763522
Link To Document :
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