Title :
Effect of drying process on photon-polymerized microstructures in resists
Author :
Sun, Quan ; Asahi, Hidenori ; Murazawa, Naoki ; Ueno, Kosei ; Misawa, Hiroaki
Author_Institution :
Res. Inst. for Electron. Sci., Hokkaido Univ., Sapporo, Japan
Abstract :
We present the fabrication of photonic microstructures using femtosecond laser direct writing technique in resist. The effect of drying process on photo-polymerized microstructures is investigated. We find that shrinkage mostly arises during the drying process.
Keywords :
drying; high-speed optical techniques; laser materials processing; microfabrication; photolithography; photonic crystals; polymerisation; resists; SZ2080 resists; drying; femtosecond laser direct writing; microfabrication; photon-polymerized microstructures; photonic crystals; photonic microstructures; shrinkage; Microstructure; Photonic crystals; Reflection; Resists; Spirals; Writing; component; femtosecond laser microfabrication; photonic crystal; photopolymerization; shrinkage;
Conference_Titel :
Advances in Optoelectronics and Micro/Nano-Optics (AOM), 2010 OSA-IEEE-COS
Conference_Location :
Guangzhou
Print_ISBN :
978-1-4244-8393-8
Electronic_ISBN :
978-1-4244-8392-1
DOI :
10.1109/AOM.2010.5713579
