Title :
Equivalent reactance model on shielding effectiveness analysis of high-transparent ring metallic mesh with submillimeter period and micrometer linewidth
Author :
Lu Zhengang ; Zhigang, Fan ; Jin Peng ; Tan Jiubin
Author_Institution :
Postdoctoral Res. Station of Opt. Eng., Harbin Inst. of Technol., Harbin, China
Abstract :
In order to accurately and efficiently analyze the shielding effectiveness of high-transparent ring metallic mesh with submillimeter period and micrometer linewidth, an equivalent reactance model for the ring metallic mesh is proposed by using the equivalent reactance of its external and internal square meshes as well as two proportional factors. A ring metallic mesh sample was fabricated by UV-lithography and its shielding effectiveness was measured at 0° and 30° incident S-polarization microwaves. Experimental results agree well with simulated results, which proves the correctness of the equivalent reactance model proposed. So the equivalent reactance model can be used in the calculation and analysis of shielding effectiveness of high-transparent ring metallic mesh.
Keywords :
electric reactance; electromagnetic shielding; metals; ultraviolet lithography; S-polarization microwaves; UV lithography; equivalent reactance model; high-transparent ring metallic mesh; micrometer linewidth; shielding effectiveness analysis; submillimeter period; Analytical models; Equivalent circuits; Microwave filters; Microwave measurements; Optical device fabrication; Optical diffraction; Optical filters; UV-lithography; electromagnetic shielding effectiveness; equivalent reactance; ring metallic mesh;
Conference_Titel :
Advances in Optoelectronics and Micro/Nano-Optics (AOM), 2010 OSA-IEEE-COS
Conference_Location :
Guangzhou
Print_ISBN :
978-1-4244-8393-8
Electronic_ISBN :
978-1-4244-8392-1
DOI :
10.1109/AOM.2010.5713595