DocumentCode
2519808
Title
Analysis of ellipsometric data for nano transparent film
Author
Zhao, Yuan ; Sheng, Ming-Yu
Author_Institution
Dept. of Opt. & Electr., Shanghai Second Polytech. Univ., Shanghai, China
fYear
2010
fDate
3-6 Dec. 2010
Firstpage
1
Lastpage
3
Abstract
Nano transparent film is widely used in the areas of photovoltaic, nanophotonics and microelectronics. The optical parameters of nano transparent film is studies by the modified ellipsometric method. In the traditional analysis of ellipsometric data, the incident light is considered as a definite plane wave. But in reality, the incident light is a finite spatial extend wavepack. Therefore, the longitude shifts due to the thickness of dielectric film, and its effect on the normalized intensity of multiple reflected wave packets in single dielectric film exit. Using the modified ellipsometry, the analysis is of high accuracy and show the result which is in good agreement with experimentally measured data.
Keywords
dielectric thin films; ellipsometry; nanostructured materials; optical films; transparency; definite plane wave; dielectric films; ellipsometric data; finite spatial extend wavepack; incident light; longitude shifts; multiple reflected wave packets; nanotransparent film; normalized intensity; optical parameters; Optical films; Optical polarization; Optical reflection; Optical surface waves; Optical variables control; Refractive index; Ellipsometry; Thin films;
fLanguage
English
Publisher
ieee
Conference_Titel
Advances in Optoelectronics and Micro/Nano-Optics (AOM), 2010 OSA-IEEE-COS
Conference_Location
Guangzhou
Print_ISBN
978-1-4244-8393-8
Electronic_ISBN
978-1-4244-8392-1
Type
conf
DOI
10.1109/AOM.2010.5713598
Filename
5713598
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