• DocumentCode
    2519823
  • Title

    Superlens for lithography

  • Author

    Zhang, Yuan ; Zhang, Daohua ; Fiddy, Michael A.

  • Author_Institution
    Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore, Singapore
  • fYear
    2010
  • fDate
    3-6 Dec. 2010
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    In this paper, we have examined the possibility of using a planar negative index lens in lithography applications.We numerically studied the field patterns generated by a PEC and Cr mask propagating through a negative index slab to form a super-resolved image of the mask at the image plane. We discuss the advantages and disadvantages of this for next generation lithography.
  • Keywords
    lenses; lithography; metamaterials; refractive index; PEC; lithography; perfect electrical conductor; planar negative index lens; superlens; superresolved image; Image resolution; Indexes; Lenses; Lithography; Metamaterials; Slabs; Surface waves; lithography; negative refraction; superlens;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advances in Optoelectronics and Micro/Nano-Optics (AOM), 2010 OSA-IEEE-COS
  • Conference_Location
    Guangzhou
  • Print_ISBN
    978-1-4244-8393-8
  • Electronic_ISBN
    978-1-4244-8392-1
  • Type

    conf

  • DOI
    10.1109/AOM.2010.5713599
  • Filename
    5713599
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2519823