• DocumentCode
    2520029
  • Title

    Analysis of LDMOS-SCR ESD protection device for 60V SOI BCD technology

  • Author

    Zhang, Peng ; Wang, Yuan ; Jia, Song ; Zhang, Xing

  • Author_Institution
    Key Lab. of Microelectron. Devices & Circuits, Peking Univ., Beijing, China
  • fYear
    2010
  • fDate
    15-17 Dec. 2010
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    A study of two major types of LDMOS-SCR electrostatic discharge protection devices for 60V SOI BCD technology is presented. The difference of the P-anode implant positions influences the triggering mechanism of the two types of devices. The relationship between I-V behavior under ESD and the device parameter is studied. Heat dissipation capability of the device is also presented.
  • Keywords
    BIMOS integrated circuits; MIS devices; cooling; electrostatic discharge; overcurrent protection; silicon-on-insulator; thyristors; LDMOS-SCR ESD protection device; LDMOS-SCR electrostatic discharge protection devices; P-anode implant positions; SOI BCD technology; device parameter; heat dissipation capability; triggering mechanism; voltage 60 V; Anodes; Robustness; LDMOS-SCR; SOI BCD Technology; triggering-voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices and Solid-State Circuits (EDSSC), 2010 IEEE International Conference of
  • Conference_Location
    Hong Kong
  • Print_ISBN
    978-1-4244-9997-7
  • Type

    conf

  • DOI
    10.1109/EDSSC.2010.5713671
  • Filename
    5713671