Title :
Performance analysis of pixelated source-mask optimization for optical microlithography
Author :
Jia, Ningning ; Lam, Edmund Y.
Author_Institution :
Dept. of Electr. & Electron. Eng., Univ. of Hong Kong Pokfulam, Hong Kong, China
Abstract :
The optical lithography is facing great challenge from the continuous shrinkage of the technology node. As one of the promising techniques, the free-form source-mask optimization (SMO) has been increasingly explored in recent years with great interests in the performance of SMO on its process robustness. In this paper, a free-form SMO framework is proposed, and its performance is tested by comparing the process window of SMO and the mask-only optimization.
Keywords :
masks; photolithography; free-form SMO framework; optical microlithography; pixelated source-mask optimization; process window; Lithography; Variable speed drives;
Conference_Titel :
Electron Devices and Solid-State Circuits (EDSSC), 2010 IEEE International Conference of
Conference_Location :
Hong Kong
Print_ISBN :
978-1-4244-9997-7
DOI :
10.1109/EDSSC.2010.5713709
