Growth and characterization of optical grade synthetic quartz

Author

Suzuki, Carlos K. ; Tanaka, Marcos S. ; Shinohara, Armando H.

Author_Institution

Dept. of Mater. Eng., Univ. Estadual de Campinas, Sao Paulo, Brazil

fYear

1996

fDate

5-7 Jun 1996

Firstpage

78

Lastpage

83

Abstract

A method to position the seed and Z-region of growth out of the circulating micro-particle flux in commercial autoclave has been used to grow optical grade synthetic quartz. The number of solid inclusions is in the range of 0.02-0.03 particles/cm³, depending on the bar. The observation of X-ray topographic contrast of (0003) reflection shows a much smaller Z-region lattice spacing (strain) in comparison with the seed. The dislocation lines are in their totality originated by the seed etch-channels, that means, they can be eliminated by using a better quality seed

Keywords

X-ray diffraction; X-ray topography; crystal growth from solution; dislocations; inclusions; internal stresses; piezoelectric materials; quartz; (0003) reflection; SiO₂; X-ray topographic contrast; Z-region; characterization; circulating micro-particle flux; commercial autoclave; crystal growth; dislocation lines; optical grade synthetic quartz; seed etch-channels; seed position; solid inclusions; strain; Capacitive sensors; Mechanical engineering; Optical distortion; Optical materials; Optical saturation; Optical scattering; Optical surface waves; Solids; Steel; Surface topography;

fLanguage

English

Publisher

ieee

Conference_Titel

Frequency Control Symposium, 1996. 50th., Proceedings of the 1996 IEEE International.

Conference_Location

Honolulu, HI

Print_ISBN

0-7803-3309-8

Type

conf

DOI

10.1109/FREQ.1996.559822

Filename

559822