Title :
Total ionizing dose effects on 4-transistor CMOS image sensor pixels
Author :
Tan, Jiaming ; Theuwissen, Albert J P
Author_Institution :
Electron. Instrum. Lab., Delft Univ. of Technol., Delft, Netherlands
Abstract :
This work presents a study on the degradation mechanism of 4T CMOS Image Sensors (CIS) induced by X-Rays irradiation. The degradation is mainly demonstrated by measurements of increased dark signal and dark random noise. The radiation affects the sensor´s behavior differently for different reset voltages and transfer gate control, which is evaluated in detail. The basic failure mechanism is presented and it shows that the radiation induced increase of random telegraph signal noise and dark random noise is mostly originated from the Si-SiO2 interface trap generation. Meanwhile, the charge trapping in the shallow trench isolation oxide (STI) is responsible for the post-irradiation dark signal increase as well. It is also illustrated that the post-irradiation pinned photodiode (PPD) and the transfer gate will obviously contribute to the sensor degradation as a post-irradiation dark signal and noise source.
Keywords :
CMOS image sensors; failure analysis; interface states; isolation technology; p-i-n photodiodes; random noise; 4T CMOS image sensor; X-Rays irradiation; dark random noise; degradation mechanism; failure mechanism; interface trap; ionizing dose effects; pinned photodiode; random telegraph signal noise; shallow trench isolation oxide; transfer gate control; Atmospheric measurements; CMOS integrated circuits; Logic gates; Particle measurements; Pixel; Sensors; Size measurement; 4T CMOS Image Sensor; STI; X-Rays irradiation; dark random noise; dark signal; interface trap; pinned photodiode;
Conference_Titel :
Electron Devices and Solid-State Circuits (EDSSC), 2010 IEEE International Conference of
Conference_Location :
Hong Kong
Print_ISBN :
978-1-4244-9997-7
DOI :
10.1109/EDSSC.2010.5713738