Title :
YAlOx as inter-poly dielectric for improved performance of flash-memory application
Author :
Huang, X.D. ; Lai, P.T.
Author_Institution :
Dept. of Electr. & Electron. Eng., Univ. of Hong Kong, Hong Kong, China
Abstract :
Y-doped Al2O3 (YAlOx) with different Y contents is studied as the inter-poly dielectric (IPD) for flash memory application. Comparing to Al2O3 and Y2O3 films, the optimized YAlOx shows lower interface-state density, better thermal properties, lower charge-trap density and smaller leakage. Therefore, the optimized YAlOx is a promising candidate as IPD for flash memory.
Keywords :
aluminium compounds; electron traps; flash memories; yttrium compounds; different Y contents; flash memory application; inter poly dielectric; interpoly dielectric; lower charge-trap density; lower interface-state density; smaller leakage; thermal properties; Hysteresis; Logic gates; Silicon; YAlOx; flash memory; inter-poly dielectric (IPD);
Conference_Titel :
Electron Devices and Solid-State Circuits (EDSSC), 2010 IEEE International Conference of
Conference_Location :
Hong Kong
Print_ISBN :
978-1-4244-9997-7
DOI :
10.1109/EDSSC.2010.5713746