Title :
Limits to voltage scaling from the low power perspective
Author :
Forestier, Arnaud ; Stan, Mircea R.
Author_Institution :
Intel Corp., Dupont, WA, USA
Abstract :
Scaling the power supply voltage enables a quadratic reduction in dynamic power dissipation with a reduction in performance which can be partially compensated by scaling the threshold voltage. There are difficult manufacturing limitations when scaling threshold voltages (mainly due to intra- and inter-chip variations) but the general view seems to be that continuous voltage scaling would be beneficial if manufacturing allowed it. While these qualitative results are well-known, we present for the first time a quantitative analysis of voltage scaling limits from the low power perspective. Our main new result is that optimizing the supply and threshold voltages for minimum energy-delay product is independent of the process or technology (up to a first order analysis). With this theoretical analysis followed by extensive simulations, we show that, for a given circuit, the optimal supply and threshold voltages are approximately the same in all CMOS technologies available through MOSIS (2 μm to 0.35 μm). This result is nonintuitive, represents a clear limit to voltage scaling from the low power point of view, and is contrary to the common view of a continuously scaling scenario if technology permits. The limit is not absolute, though, since it can be overcome by circuit design techniques (e.g. reducing logic depth), or other techniques (e.g. cooling)
Keywords :
CMOS integrated circuits; integrated circuit design; low-power electronics; 2 to 0.35 micron; CMOS circuit; MOSIS technology; dynamic power dissipation; energy-delay product; low power design; power supply voltage scaling; threshold voltage scaling; Analytical models; CMOS technology; Circuit simulation; Circuit synthesis; Dynamic voltage scaling; Logic design; Manufacturing; Power dissipation; Power supplies; Threshold voltage;
Conference_Titel :
Integrated Circuits and Systems Design, 2000. Proceedings. 13th Symposium on
Conference_Location :
Manaus
Print_ISBN :
0-7695-0843-X
DOI :
10.1109/SBCCI.2000.876056