• DocumentCode
    2522318
  • Title

    Millimeter-wave high temperature process monitoring

  • Author

    Woskov, P.

  • Author_Institution
    Plasma Sci. & Fusion Center, MIT, Cambridge, MA, USA
  • fYear
    2002
  • fDate
    26-26 Sept. 2002
  • Abstract
    Millimeter-wave technologies can provide novel and reliable on-line monitoring capability for many important parameters inside high temperature process environments such as in the manufacture of glass, metals, and waste remediation. Important parameters include temperature, emissivity, density, and viscosity, which often cannot be monitored reliably by conventional techniques. The physical and analytical basis for millimeter-wave monitoring of high temperature processes is presented along with experimental results at temperatures up to 1500/spl deg/C.
  • Keywords
    computerised monitoring; condition monitoring; density measurement; emissivity; high-temperature techniques; millimetre wave measurement; process monitoring; recycling; viscosity measurement; 1500 C; analytical basis; density; emissivity; glass manufacture; high temperature process environments; metal processing; millimeter-wave high temperature process monitoring; millimeter-wave monitoring; millimeter-wave technologies; physical basis; process temperature; reliable on-line monitoring; viscosity; waste remediation; Glass; Millimeter wave measurements; Millimeter wave technology; Monitoring; Optical receivers; Optical refraction; Optical waveguides; Plasma temperature; Temperature measurement; Temperature sensors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Infrared and Millimeter Waves, 2002. Conference Digest. Twenty Seventh International Conference on
  • Conference_Location
    San Diego, CA, USA
  • Print_ISBN
    0-7803-7423-1
  • Type

    conf

  • DOI
    10.1109/ICIMW.2002.1076052
  • Filename
    1076052