DocumentCode
2522318
Title
Millimeter-wave high temperature process monitoring
Author
Woskov, P.
Author_Institution
Plasma Sci. & Fusion Center, MIT, Cambridge, MA, USA
fYear
2002
fDate
26-26 Sept. 2002
Abstract
Millimeter-wave technologies can provide novel and reliable on-line monitoring capability for many important parameters inside high temperature process environments such as in the manufacture of glass, metals, and waste remediation. Important parameters include temperature, emissivity, density, and viscosity, which often cannot be monitored reliably by conventional techniques. The physical and analytical basis for millimeter-wave monitoring of high temperature processes is presented along with experimental results at temperatures up to 1500/spl deg/C.
Keywords
computerised monitoring; condition monitoring; density measurement; emissivity; high-temperature techniques; millimetre wave measurement; process monitoring; recycling; viscosity measurement; 1500 C; analytical basis; density; emissivity; glass manufacture; high temperature process environments; metal processing; millimeter-wave high temperature process monitoring; millimeter-wave monitoring; millimeter-wave technologies; physical basis; process temperature; reliable on-line monitoring; viscosity; waste remediation; Glass; Millimeter wave measurements; Millimeter wave technology; Monitoring; Optical receivers; Optical refraction; Optical waveguides; Plasma temperature; Temperature measurement; Temperature sensors;
fLanguage
English
Publisher
ieee
Conference_Titel
Infrared and Millimeter Waves, 2002. Conference Digest. Twenty Seventh International Conference on
Conference_Location
San Diego, CA, USA
Print_ISBN
0-7803-7423-1
Type
conf
DOI
10.1109/ICIMW.2002.1076052
Filename
1076052
Link To Document