• DocumentCode
    2522990
  • Title

    Application of spectrophotometry and ellipsometry for determination of optical parameters of optical coating thin films

  • Author

    Domaradzki, Jaroslaw ; Lis, Szymon ; Kaczmarek, Danuta ; Patela, Sergiusz

  • Author_Institution
    Fac. of Microsyst. Electron. & Photonics, Wroclaw Univ. of Technol., Wroclaw, Poland
  • fYear
    2010
  • fDate
    25-27 June 2010
  • Firstpage
    10
  • Lastpage
    13
  • Abstract
    In the present work usefulness of spectrophotometry and ellipsometry for the determination of different parameters of optical thin films have been discussed. The principles of their operation and some exemplary results for TiO2 thin films deposited by magnetron sputtering are presented.
  • Keywords
    antireflection coatings; ellipsometry; optical films; refractive index; semiconductor growth; semiconductor thin films; spectrophotometry; sputter deposition; titanium compounds; TiO2; anatase thin films; ellipsometry; magnetron sputtering; optical coating thin films; optical parameters; refractive index; spectrophotometry; Ellipsometry; Optical films; Optical reflection; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Students and Young Scientists Workshop, 2010 IEEE International
  • Conference_Location
    Szklarska Poreba
  • Print_ISBN
    978-1-4244-8324-2
  • Type

    conf

  • DOI
    10.1109/STYSW.2010.5714158
  • Filename
    5714158
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2522990