DocumentCode :
2522990
Title :
Application of spectrophotometry and ellipsometry for determination of optical parameters of optical coating thin films
Author :
Domaradzki, Jaroslaw ; Lis, Szymon ; Kaczmarek, Danuta ; Patela, Sergiusz
Author_Institution :
Fac. of Microsyst. Electron. & Photonics, Wroclaw Univ. of Technol., Wroclaw, Poland
fYear :
2010
fDate :
25-27 June 2010
Firstpage :
10
Lastpage :
13
Abstract :
In the present work usefulness of spectrophotometry and ellipsometry for the determination of different parameters of optical thin films have been discussed. The principles of their operation and some exemplary results for TiO2 thin films deposited by magnetron sputtering are presented.
Keywords :
antireflection coatings; ellipsometry; optical films; refractive index; semiconductor growth; semiconductor thin films; spectrophotometry; sputter deposition; titanium compounds; TiO2; anatase thin films; ellipsometry; magnetron sputtering; optical coating thin films; optical parameters; refractive index; spectrophotometry; Ellipsometry; Optical films; Optical reflection; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Students and Young Scientists Workshop, 2010 IEEE International
Conference_Location :
Szklarska Poreba
Print_ISBN :
978-1-4244-8324-2
Type :
conf
DOI :
10.1109/STYSW.2010.5714158
Filename :
5714158
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2522990
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