DocumentCode :
2523197
Title :
Segmented iterative learning control for precision positioning of waferstages
Author :
Mishra, Sandipan ; Tomizuka, Masayoshi
Author_Institution :
Univ. of California, Berkeley
fYear :
2007
fDate :
4-7 Sept. 2007
Firstpage :
1
Lastpage :
6
Abstract :
This paper presents an application of a segmented iterative learning control (ILC) scheme for precision positioning of wafer stages using linear motors. The process of wafer scanning is repetitive, hence ILC has been used to improve performance from cycle to cycle. However, using uniform learning over the entire cycle results in degraded performance in those areas of the trajectory where nonrepetitive disturbances dominate. The paper proposes and compares implementation and performance of a segmented ILC scheme (a segmented P-type ILC algorithm) vis-a-vis a standard P-type ILC algorithm. Segmentation refers to separating the repetitive process into smaller segments with different learning rates. In this paper, we first consider the simple case of on-off learning, i.e., in certain segments learning is switched on, and in others, no learning is done. A metric is proposed to determine which segments to learn, and sufficient conditions for convergence and stability aspects of an on-off type segmented ILC scheme are presented. Finally, a comparison of the segmented ILC scheme and the standard P-type scheme is provided to illustrate the advantages of segmentation. Experimental validation of the theory developed is provided by implementation of these ILC schemes on a one-DOF prototype wafer stage.
Keywords :
iterative methods; learning systems; linear motors; semiconductor device manufacture; P-type ILC algorithm; linear motors; segmented iterative learning control; semiconductor manufacturing; wafer scanning process; wafer stage precision positioning; Adaptive control; Bandwidth; Degradation; Frequency; Lithography; Mechanical engineering; Motion control; Radio control; Robust control; Semiconductor device manufacture; Index Terms-Iterative Learning Control; Photolithography; Precision Positioning; Semicondunctor Manufacturing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced intelligent mechatronics, 2007 IEEE/ASME international conference on
Conference_Location :
Zurich
Print_ISBN :
978-1-4244-1263-1
Electronic_ISBN :
978-1-4244-1264-8
Type :
conf
DOI :
10.1109/AIM.2007.4412577
Filename :
4412577
Link To Document :
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