Application of AFM microscope as a nanolithography tool

Author

Ramiaczek-Krasowska, Maria ; Prazmowska, Joanna ; Szyszka, Adam ; Paszkiewicz, Regina ; Tlaczala, Marek

Author_Institution

Fac. of Microsyst. Electron. & Photonics, Wroclaw Univ. of Technol., Wrocław, Poland

fYear

2010

fDate

25-27 June 2010

Firstpage

69

Lastpage

72

Abstract

The lithography as a basic process determines properties of microelectronic device. The main area of investigation is the resolution of the lithography operation. The resolution of optical lithography is insufficient for creation of gate electrodes in dedicated to high frequency operation transistors. The scaling ability causes increased interest in using of atomic force microscope (AFM) as nanolithography tool. In the paper, the results of the nanoscratching lithography by using AFM are presented. In this method a pattern is created in mechanical interaction of the AFM tip and the samples surface.

Keywords

atomic force microscopy; nanolithography; photolithography; transistors; AFM microscope; atomic force microscope; gate electrodes; high frequency operation transistors; microelectronic device; nanolithography tool; nanoscratching lithography; optical lithography; Artificial neural networks; Equations; Resists;

fLanguage

English

Publisher

ieee

Conference_Titel

Students and Young Scientists Workshop, 2010 IEEE International

Conference_Location

Szklarska Poreba

Print_ISBN

978-1-4244-8324-2

Type

conf

DOI

10.1109/STYSW.2010.5714172

Filename

5714172