DocumentCode
2523468
Title
Nanolocalization of features in the patterns produced by Four-beam Laser Interference Lithography
Author
Xiu, Guowei ; Song, Zhengxun ; Hu, Zhen ; Weng, Zhankun
Author_Institution
Centre for Nano Metrol. & Manuf. Technol., Changchun Univ. of Sci. & Technol., Changchun, China
fYear
2010
fDate
10-12 Sept. 2010
Firstpage
130
Lastpage
134
Abstract
This paper presents a method for nanolocalization of features in the patterns produced by Four-beam Laser Interference Lithography (FBLIL) using image processing techniques. In the work, the least-squares fitting method was used for nanolocalization of features, having obtained the main parameters of the pattern by both simulation and experiment. The results have shown that the method is useful for the nanolocalization of the pattern features in laser interference lithography.
Keywords
electronic engineering computing; feature extraction; least squares approximations; light interferometry; nanolithography; feature nanolocalization; four-beam laser interference lithography; image processing; least-squares fitting method; pattern features; Image segmentation; Interference; Lithography; Pixel; FBLIL; image processing; least-squares fitting; nanolocalization;
fLanguage
English
Publisher
ieee
Conference_Titel
Mechanical and Electrical Technology (ICMET), 2010 2nd International Conference on
Conference_Location
Singapore
Print_ISBN
978-1-4244-8100-2
Electronic_ISBN
978-1-4244-8102-6
Type
conf
DOI
10.1109/ICMET.2010.5598336
Filename
5598336
Link To Document