Title :
Nanolocalization of features in the patterns produced by Four-beam Laser Interference Lithography
Author :
Xiu, Guowei ; Song, Zhengxun ; Hu, Zhen ; Weng, Zhankun
Author_Institution :
Centre for Nano Metrol. & Manuf. Technol., Changchun Univ. of Sci. & Technol., Changchun, China
Abstract :
This paper presents a method for nanolocalization of features in the patterns produced by Four-beam Laser Interference Lithography (FBLIL) using image processing techniques. In the work, the least-squares fitting method was used for nanolocalization of features, having obtained the main parameters of the pattern by both simulation and experiment. The results have shown that the method is useful for the nanolocalization of the pattern features in laser interference lithography.
Keywords :
electronic engineering computing; feature extraction; least squares approximations; light interferometry; nanolithography; feature nanolocalization; four-beam laser interference lithography; image processing; least-squares fitting method; pattern features; Image segmentation; Interference; Lithography; Pixel; FBLIL; image processing; least-squares fitting; nanolocalization;
Conference_Titel :
Mechanical and Electrical Technology (ICMET), 2010 2nd International Conference on
Conference_Location :
Singapore
Print_ISBN :
978-1-4244-8100-2
Electronic_ISBN :
978-1-4244-8102-6
DOI :
10.1109/ICMET.2010.5598336
