DocumentCode :
2525588
Title :
A low driving voltage CCD with single layer electrode structure for area image sensor
Author :
Tanaka, N. ; Nakamura, N. ; Matsunaga, Y. ; Manabe, S. ; Yoshida, O.
Author_Institution :
ULSI Res. Center, Toshiba Corp., Kawasaki, Japan
fYear :
1994
fDate :
11-14 Dec. 1994
Firstpage :
705
Lastpage :
708
Abstract :
A single layer electrode two-phase CCD is studied for the purpose of obtaining low power consumption interline-transfer CCD(IT-CCD) image sensor. The CCD has both a storage region under a thick gate oxide and a barrier region under a thin gate oxide for each transfer electrode. In order to attain high charge transfer efficiency for an extremely low driving voltage below 2 V, a new alignment-deviation-free structure and a potential pocket suppression structure are introduced. A 1/3 inch format 270 K pixel IT-CCD image sensor with the horizontal CCD driving voltage of 1.8 V is developed by employing the single layer electrode structure for the first time. The four-phase vertical CCDs also have the single layer electrode structure. The single layer electrode structure is very useful for vertical scale-down which is indispensable for the chip size shrinking.<>
Keywords :
CCD image sensors; power consumption; area image sensor; barrier region; interline-transfer; low driving voltage CCD; pocket suppression structure; single layer electrode structure; thick gate oxide; two-phase CCD; Boron; Charge coupled devices; Charge transfer; Degradation; Electrodes; Energy consumption; Image sensors; Image storage; Low voltage; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1994. IEDM '94. Technical Digest., International
Conference_Location :
San Francisco, CA, USA
ISSN :
0163-1918
Print_ISBN :
0-7803-2111-1
Type :
conf
DOI :
10.1109/IEDM.1994.383316
Filename :
383316
Link To Document :
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