DocumentCode :
252597
Title :
Near-threshold voltage operation of a nonvolatile SRAM cell based on pseudo-spin-FinFET architecture
Author :
Shuto, Y. ; Yamamoto, S. ; Sugahara, S.
Author_Institution :
Imaging Sci. & Eng. Lab., Tokyo Inst. of Technol., Yokohama, Japan
fYear :
2014
fDate :
6-9 Oct. 2014
Firstpage :
1
Lastpage :
2
Abstract :
The bias assist techniques and power switch design for stable near-threshold voltage operations of the NV-SRAM cell are investigated. Although the pull-up of VDD is necessary for the store operation, this executes only at the moment of the shutdown of the cell and the energy required for the store operation can be completely compensated by the shutdown during a period prescribed by break-even time [8]. The NV-SRAM cell using PS-FinFETs is promising for the NVPG architecture of near-threshold-voltage CMOS logic systems.
Keywords :
CMOS logic circuits; CMOS memory circuits; SRAM chips; power MOSFET; CMOS logic systems; bias assist techniques; near-threshold voltage operation; nonvolatile SRAM cell; power switch design; pseudospin-FinFET architecture; FinFETs; Magnetic resonance imaging; Magnetic tunneling; Standards;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), 2014 IEEE
Conference_Location :
Millbrae, CA
Type :
conf
DOI :
10.1109/S3S.2014.7028239
Filename :
7028239
Link To Document :
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