DocumentCode
252647
Title
In-plane-excited silicon nanowire arrays-patterned cantilever sensors for enhanced airborne particulate matter exposure detection
Author
Wasisto, Hutomo Suryo ; Merzsch, Stephan ; Steib, Frederik ; Waag, Andreas ; Peiner, Erwin
Author_Institution
Inst. of Semicond. Technol. (IHT), Braunschweig Univ. of Technol., Braunschweig, Germany
fYear
2014
fDate
13-16 April 2014
Firstpage
32
Lastpage
37
Abstract
This paper presents the design, fabrication, and use of silicon nanowire (SiNW) arrays-patterned microcantilever sensors excited in the in-plane resonance mode to enhance the detection of airborne particulate matter (PM). Electrothermal excitation elements of p-diffused heating resistors were introduced in the current sensor system to replace the formerly used external piezoceramic stack actuator. The sensors exhibited high measured quality factors (Q-factors) of 4702 ± 102 during their in-plane mode operations in air, which are four times larger than those of the fundamental out-of-plane mode. To selectively define arrays of vertical SiNWs on the surface of the micromechanical cantilever, nanoimprint lithography (NIL) is combined with conventional photolithography. The diameter and position of the SiNWs can be adjusted depending on the nanoimprint stamp with the smallest cylindrical pattern possible down to 50 nm in diameter. By modifying the resonator surface, the PM sampling efficiency can be improved by a factor of 1.5 greater than that of a corresponding plain cantilever in a cigarette smoke exposure experiment because of the rise in collection surface area of the sensor given by the SiNWs.
Keywords
aerosols; air pollution measurement; cantilevers; micromechanical resonators; nanolithography; nanosensors; nanowires; photolithography; piezoresistive devices; silicon; soft lithography; Si; conventional photolithography; current sensor system; electrothermal excitation; enhanced airborne particulate matter exposure detection; external piezoceramic stack actuator; heating resistors; in-plane excited silicon nanowire arrays; micromechanical cantilever; nanoimprint lithography; patterned microcantilever sensor; resonator surface modification; Fabrication; Heating; Resonant frequency; Sensor phenomena and characterization; Silicon; Surface treatment; in-plane excitation; microcantilever; particulate matter; resonant frequency; silicon nanowire;
fLanguage
English
Publisher
ieee
Conference_Titel
Nano/Micro Engineered and Molecular Systems (NEMS), 2014 9th IEEE International Conference on
Conference_Location
Waikiki Beach, HI
Type
conf
DOI
10.1109/NEMS.2014.6908753
Filename
6908753
Link To Document