• DocumentCode
    252682
  • Title

    Study on electrical characteristics for active die embedding substrate

  • Author

    HyunHo Kim

  • Author_Institution
    Center for Integrated Smart Sensors, Daehak-Ro, South Korea
  • fYear
    2014
  • fDate
    3-5 Dec. 2014
  • Firstpage
    204
  • Lastpage
    208
  • Abstract
    This paper presents study on electrical characteristics of active die embedded substrate that is embedded active devices inside substrate. Active die embedding substrate samples are fabricated using embedding process that consists of lamination process, laser drilling at the electrode Cu pads of active device, electroless Cu plating formation process such as photolithography, electrolytic Cu plating, and etching. Interconnection reliability between external pad of substrate and pad of embedding active devices is evaluated by cross-section and in-circuit test of active die embedding substrate using temperature cycle (T/C) test (-55/+125°C, 1000cycle).
  • Keywords
    copper; electroless deposition; electroplating; etching; integrated circuit interconnections; integrated circuit packaging; integrated circuit reliability; integrated circuit testing; laser beam machining; photolithography; Cu; active die embedded substrate; cross-section test; electrical characteristics; electrode copper pads; electroless copper plating; electrolytic copper plating; embedded active devices; embedding process; etching; in-circuit test; interconnection reliability; lamination process; laser drilling; photolithography; Cavity resonators; Integrated circuit interconnections; Reliability; Substrates; Testing; Transmission line measurements; Voltage measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronics Packaging Technology Conference (EPTC), 2014 IEEE 16th
  • Conference_Location
    Singapore
  • Type

    conf

  • DOI
    10.1109/EPTC.2014.7028286
  • Filename
    7028286