Title :
Nano-scale tip fabricated by electro-chemical machining for nano lithography
Author :
Yuan-Jen Chang ; Han-Kuan Huang
Author_Institution :
Dept. of Mech. Eng., Nat. Yunlin Univ. of Sci. & Technol., Yunlin, Taiwan
Abstract :
Tip-based nanolithography provides a flexible nano-lithographic technology. The tip fabrication is the main challenge of the technology. In this paper, we propose to combine the dry etching of photoresist and electro-chemical machining to reduce the size of the tip opening. We successfully fabricate a tip opening with the dimension of 220 nm. After lithography and lift-off, the gold dot patterns with a diameter of 200 nm are demonstrated.
Keywords :
electrochemical machining; gold; nanofabrication; nanolithography; photoresists; Au; electrochemical machining; flexible nanolithographic technology; gold dot patterns; nanoscale tip fabrication; photoresist dry etching; size 200 nm; size 220 nm; tip-based nanolithography; Copper; Electronic countermeasures; Fabrication; Nanolithography; Silicon; Substrates;
Conference_Titel :
Nano/Micro Engineered and Molecular Systems (NEMS), 2014 9th IEEE International Conference on
Conference_Location :
Waikiki Beach, HI
DOI :
10.1109/NEMS.2014.6908774
