Micromechanical resonators for frequency references and signal processing

Summary form only given, as follows. This paper reviews the application of silicon micromachining to the fabrication of electrostatically driven and capacitively sensed micromechanical resonators. These structures can be surface-micromachined from polysilicon and also, from single crystal silicon using wafer bonding and etch-back, with both technologies compatible with integration of drive and sense CMOS electronics. The potential applications of these structures to integrated frequency references, micromechanical filters and mixers are described. The passband characteristics of these resonators can be adjusted electrically. Integrated micro-ovens for temperature control have been demonstrated, as well. Finally, we assess the frequency range and prospects for micromechanical signal processing.<>