DocumentCode :
2527394
Title :
Bias and temperature dependence of gate and substrate currents in n-MOSFETS at low drain voltage
Author :
Esseni, D. ; Selmi, L. ; Bez, A. ; Sangiorgi, E. ; Ricco, B.
Author_Institution :
Dipartimento di Elettronica Inf. e Sistemistica, Bologna Univ., Italy
fYear :
1994
fDate :
11-14 Dec. 1994
Firstpage :
307
Lastpage :
310
Abstract :
This paper presents new experimental data on the bias and temperature dependence of the gate (I/sub G/) and substrate (I/sub B/) current of submicron MOSFETs at drain voltages much smaller than the Si-SiO/sub 2/ energy barrier (V/sub DS//spl Lt//spl Phi//sub bq//spl sime/3.15 V). In particular, we investigate the so called substrate current crossover effect, by reporting for the first time simultaneous measurements of I/sub G/ and I/sub B/ at V/sub DS/ lower than the crossover voltage (V/sub XOVER/), defined as the drain voltage below which the derivative of I/sub BMAX/ versus temperature (T) changes from negative to positive. The results indicate that I/sub B/ and I/sub G/ at low V/sub DS/ exhibit opposite temperature dependence thus raising new questions on the interpretation of the crossover effect.<>
Keywords :
MOSFET; electric current; hot carriers; Si-SiO/sub 2/; Si-SiO/sub 2/ energy barrier; bias dependence; gate currents; hot carrier currents; low drain voltage; n-MOSFETS; n-channel devices; submicron MOSFETs; substrate current crossover effect; substrate currents; temperature dependence; Current measurement; Distribution functions; Energy barrier; Hot carriers; Low voltage; MOSFET circuits; Physics; Pulse measurements; Temperature dependence; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1994. IEDM '94. Technical Digest., International
Conference_Location :
San Francisco, CA, USA
ISSN :
0163-1918
Print_ISBN :
0-7803-2111-1
Type :
conf
DOI :
10.1109/IEDM.1994.383406
Filename :
383406
Link To Document :
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