DocumentCode :
2527493
Title :
Vacuum-sealed silicon micromachined incandescent light source
Author :
Mastrangelo, C.H. ; Muller, R.S.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA
fYear :
1989
fDate :
3-6 Dec. 1989
Firstpage :
503
Lastpage :
506
Abstract :
A silicon-filament vacuum-sealed incandescent light has been fabricated using technologies and materials derived from IC processes. The incandescent source consists of a heavily doped p/sup +/ polysilicon filament coated with silicon nitride and enclosed in a vacuum-sealed ( approximately=80 mT) cavity. The filament is electrically heated to reach a maximum temperature between 1500 and 1600 K, corresponding to a peak black body wavelength at approximately 2 mu m. The power required to achieve this temperature in a filament 350*3*1 mu m/sup 3/ is 3.5 mW. The cavity is sealed with a silicon-nitride window that is highly transmissive to the emitted radiation. The microlamp can be processed compatibly with circuits and has been operated in a liquid ambient. Without substrate cooling it requires several milliseconds for complete turn-off after being disconnected from power.<>
Keywords :
elemental semiconductors; filament lamps; integrated circuit technology; light sources; micromechanical devices; silicon; 1500 to 1600 K; 2 micron; 3.5 mW; IC processes; Si; cavity; complete turn-off; emitted radiation; incandescent source; liquid ambient; microlamp; peak black body wavelength; vacuum-sealed cavity; vacuum-sealed incandescent light; wafer processing; Chemical analysis; Displays; Etching; Fabrication; Infrared sensors; Light sources; Seals; Silicon; Substrates; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1989. IEDM '89. Technical Digest., International
Conference_Location :
Washington, DC, USA
ISSN :
0163-1918
Print_ISBN :
0-7803-0817-4
Type :
conf
DOI :
10.1109/IEDM.1989.74331
Filename :
74331
Link To Document :
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