Abstract :
Cathodic arc plasma is one of the potential ion plating PVD methods to prepare protective coatings on cutting tools, metal mold, etc. Especially, TiN, CrN, and TiAlN films are coated on industrial cutting tools using cathodic arc plasma. However, the cathode spot of the vacuum arc generates macrodroplets as co-products of cathodic arc plasma containing high energy ions. These macrodroplets may pose problems with smooth-surface films used for advanced high-precision applications. This paper reviews the techniques for reduction of macrodroplet generation and their removal of macrodroplets from the processing plasma. The reduction technique includes steered arc, pulsed arcs, etc. The removal technique includes shielded arcs and filtered arcs. Recent filtered arc deposition systems are referred
Keywords :
aluminium compounds; arcs (electric); cathodes; chromium compounds; ion plating; plasma materials processing; thin films; titanium compounds; vacuum deposition; CrN; TiAlN; TiN; cathode spot; cathodic arc deposition; cathodic arc plasma; droplet-free thin films; filtered arc deposition systems; industrial cutting tools; ion plating PVD methods; macrodroplet generation; protective coatings; shielded arcs; smooth-surface films; vacuum arc; Atherosclerosis; Cathodes; Coatings; Cutting tools; Plasma applications; Plasma materials processing; Protection; Sputtering; Tin; Vacuum arcs;
