Title :
A novel technique for Support Vector Machine based multi-class classifier
Author :
Manikandan, J. ; Venkataramani, B. ; Amudha, V. ; Arafat, A. Majed ; Sahu, Hruday
Author_Institution :
Dept. of ECE, Nat. Inst. of Technol., Trichy
Abstract :
Support Vector Machine (SVM) is one of the state-of-the-art tools for linear and nonlinear pattern classification. One of the design issues in SVM classifier is reducing the number of support vectors without compromising the classification accuracy. In this paper, a novel technique known as Diminishing Learning (DL) is proposed for an SVM based multi-class pattern recognition system. In this technique, a sequential classifier is proposed wherein the classes which require stringent boundaries are tested one by one and once the tests for these classes fail, the stringency of the classifier is increasingly relaxed. The effect of, the sequence in which the classes are trained and tested, on the recognition accuracy is also studied in this paper. The proposed technique is applied for SVM based isolated digit recognition system and is studied using speaker dependent TI46 database of isolated digits. Two feature extraction techniques, one using LPC and another using MFCC are applied to the speech from the above database and the features are mapped using SOFM. This in turn is used by the SVM classifier to evaluate the recognition accuracy with and without DL technique. Based on this study, it is found that the use of diminishing learning reduces the number of support vectors by 35.5% and 39.5% respectively for SVM classifier with LPC and MFCC feature inputs. Recognition accuracies of 96% and 97% are achieved for SVM classifier with and without DL technique for LPC feature inputs respectively. Recognition accuracy of 100% is achieved for SVM with and without DL technique for MFCC feature inputs. The study confirms the effect of, the order in which the classes are trained and tested, on the recognition accuracy and for the TI46 database, about 7% increase in recognition accuracy is obtained by choosing the optimum order.
Keywords :
feature extraction; pattern classification; support vector machines; LPC; MFCC; diminishing learning; feature extraction techniques; isolated digit recognition system; multi-class classifier; multi-class pattern recognition system; nonlinear pattern classification; sequential classifier; support vector machine; Feature extraction; Linear predictive coding; Mel frequency cepstral coefficient; Pattern classification; Pattern recognition; Sequential analysis; Spatial databases; Support vector machine classification; Support vector machines; Testing;
Conference_Titel :
TENCON 2008 - 2008 IEEE Region 10 Conference
Conference_Location :
Hyderabad
Print_ISBN :
978-1-4244-2408-5
Electronic_ISBN :
978-1-4244-2409-2
DOI :
10.1109/TENCON.2008.4766586