Improvement on the Property of TiO2 Films due to Plasma Processing

Author

Murata, H. ; Sakamaki, T. ; Yoshizawa, A. ; Uwatoko, M. ; Kogoshi, S.

Author_Institution

Tokyo Univ. of Sci., Chiba

Volume

2

fYear

2006

fDate

25-29 Sept. 2006

Firstpage

572

Lastpage

575

Abstract

TiO₂ films are known to be effective as a photo-catalyst for abatement of NOx and volatile organic compounds. However, they can´t normally be activated with visible rays. The TiO₂ films have been processed by hydrogen or nitrogen plasma in order to absorb some of visible rays. The abatement experiments of NOx and HCHO using the TiO₂ films were carried out. The results showed that the reduction rate of NOx by the hydrogen plasma processed TiO₂ film was higher than that of the nitrogen plasma processed one by 1.1 times and that of no processed one by 1.7 times when using a chemical lamp and by more than 10 times when using an ordinary fluorescent lamp, which suggests that the plasma processed TiO ₂ films are activated with visible rays

Keywords

metallic thin films; plasma materials processing; plasma sources; titanium compounds; TiO₂; chemical lamp; hydrogen plasma; nitrogen plasma; plasma processed films; plasma processing; Fluorescent lamps; Hydrogen; Plasma chemistry; Plasma density; Plasma materials processing; Plasma properties; Plasma sources; Plasma waves; Sputtering; Surface waves;

fLanguage

English

Publisher

ieee

Conference_Titel

Discharges and Electrical Insulation in Vacuum, 2006. ISDEIV '06. International Symposium on

Conference_Location

Matsue

ISSN

1093-2941

Print_ISBN

1-4244-0191-7

Electronic_ISBN

1093-2941

Type

conf

DOI

10.1109/DEIV.2006.357366

Filename

4194947