DocumentCode :
252805
Title :
Effect of copper roughness on dielectric adhesion
Author :
Boon, S.S.S. ; Ho, S.W.D. ; Ding Liang ; Sek Soon Ann
Author_Institution :
Inst. of Microelectron., Agency for Sci., Technol. & Res., Singapore, Singapore
fYear :
2014
fDate :
3-5 Dec. 2014
Firstpage :
793
Lastpage :
796
Abstract :
The effect of processing the photo-sensitive insulating material on different copper surface roughness could illustrate the effect on the adhesion of these materials with a variation in surface roughness. A correlation study was conducted with copper roughness with application of both high-temperature & low-temperature curing dielectric to gain a better understanding of the resultant adhesion strength to the change in surface roughness. The morphology of the copper surface and adhesion of the polymer demonstrated the effect of chemical bonding and mechanical interlocking.
Keywords :
adhesion; bonds (chemical); copper; curing; dielectric materials; insulating materials; surface roughness; Cu; adhesion strength; chemical bonding; dielectric adhesion; high-temperature curing dielectric; low-temperature curing dielectric; mechanical interlocking; photosensitive insulating material; surface roughness; Copper; Polymers; Rough surfaces; Surface morphology; Surface roughness; Surface treatment;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics Packaging Technology Conference (EPTC), 2014 IEEE 16th
Conference_Location :
Singapore
Type :
conf
DOI :
10.1109/EPTC.2014.7028351
Filename :
7028351
Link To Document :
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