Title :
Optimization of the LaB6 Cathode for Divertor Plasma Simulator (DiPS)
Author :
Woo, H.-J. ; Chung, K.-S. ; You, H.-J. ; Seo, Y.-J. ; Choi, G.-S. ; Lho, T.
Author_Institution :
Electr. Probe Applications Lab., Hanyang Univ., Seoul
Abstract :
A steady-state high density LaB6 dc plasma source is developed for the divertor plasma simulator (DiPS), which is a linear device for the studies on various electric probes, plasma-wall interactions, atomic processes, and for the development of plasma diagnostics. Since the LaB6 is very weak against the thermal shock, which is possibly caused by the overflow of the discharge current in a flash, and leads to cracking the LaB6 plate, the source is to be designed lower the thermal stress for stable and longer operation. Thermal shock can be mitigated by optimizing the configurations of the magnetic and electric fields with floating electrode. Magnetic cusp is formed between the LaB6 cathode and anode in order for ion bombardment to the LaB6 plate to be uniform over the surface and in order for electrons to follow the field lines and to wet the surface of the anode uniformly. Electric field is generated such that the maximum outflow of electrons toward the anode can be maximized by adjusting the direction of the field and by locating a floating electrode between LaB6 cathode and anode. The LaB6 source is composed of a cylindrical LaB6 plate with 4 inches in diameter, graphite heater and Ta heat shield. From the different electric and magnetic field configurations, the LaB 6 dc plasma source is optimized as ne=1014 cm-3 (Ar), 1013 cm-3 (He), Te=2 - 3 eV (Ar), 5 - 10 eV (He) and Ti les 0.2 eV (Ar)
Keywords :
cathodes; fusion reactor divertors; lanthanum compounds; plasma diagnostics; plasma probes; plasma simulation; plasma sources; plasma-wall interactions; thermal stress cracking; 4 inches; DiPS; LaB6; LaB6 cathode; atomic processes; dc plasma source; divertor plasma simulator; electric probes; floating electrode; ion bombardment; linear device; magnetic cusp; plasma diagnostics; plasma-wall interactions; thermal shock; Anodes; Argon; Cathodes; Electric shock; Plasma density; Plasma devices; Plasma diagnostics; Plasma simulation; Plasma sources; Thermal stresses;
Conference_Titel :
Discharges and Electrical Insulation in Vacuum, 2006. ISDEIV '06. International Symposium on
Conference_Location :
Matsue
Print_ISBN :
1-4244-0191-7
Electronic_ISBN :
1093-2941
DOI :
10.1109/DEIV.2006.357400