• DocumentCode
    2528732
  • Title

    Ultra-low voltage nano-scale embedded RAMs

  • Author

    Itoh, K. ; Horiguchi, M. ; Kawahara, T.

  • Author_Institution
    Central Res. Lab., Hitachi, Ltd., Tokyo
  • fYear
    2006
  • fDate
    21-24 May 2006
  • Lastpage
    28
  • Abstract
    Ultra-low voltage nano-scale embedded RAMs are described, focusing on RAM cells and peripheral circuits. First, challenges and trends of low-voltage RAM cells are discussed in terms of signal charge, signal voltage, and noise. ECC to cope with the ever-increasing soft-error rate, power-supply controls to widen the voltage margin of cells, and a fully-depleted SOI to reduce VT-variation are also investigated. Then peripheral circuits are explained in terms of leakage reduction and compensation for speed variations. Based on this, it is concluded that ultra-low voltage RAMs cannot be achieved without reducing speed variations caused by variations in VT, thus resulting in a further need for compensation circuits and new devices with reduced VT variation
  • Keywords
    DRAM chips; SRAM chips; embedded systems; low-power electronics; nanoelectronics; RAM cells; compensation circuits; leakage reduction; peripheral circuits; power-supply controls; signal charge; signal voltage; ultralow voltage nanoscale embedded RAM; Circuit noise; Laboratories; Logic arrays; Logic circuits; Nanoscale devices; Parasitic capacitance; Power dissipation; Random access memory; Signal design; Voltage control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Circuits and Systems, 2006. ISCAS 2006. Proceedings. 2006 IEEE International Symposium on
  • Conference_Location
    Island of Kos
  • Print_ISBN
    0-7803-9389-9
  • Type

    conf

  • DOI
    10.1109/ISCAS.2006.1692513
  • Filename
    1692513