Title :
Throughput comparison of multi-exposure and multi-beam laser interference lithography on nano patterned sapphire substrate process
Author :
Lin, Tao ; Huang, Tingwen ; Yang, Yi ; Tseng, K. ; Fu, Chuancheng
Author_Institution :
Dept. of Power Mech. Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan
Abstract :
This research provides a new approach, laser interference lithography (LIL), to fabricate PSS and NPSS. Yet, there are two ways to pattern hexagonal 2D array on sapphire by LIL. First is multi-exposure LIL, and the second is multi-beam LIL. In conclusion, simulation results in this research may have verified that multi-beam LIL has significantly better throughput than multi-exposure LIL; the result also support the superiority of negative photoresist over positive photoresist.
Keywords :
nanolithography; nanopatterning; photoresists; Al2O3; NPSS; hexagonal 2D array; multibeam laser interference lithography; multiexposure laser interference lithography; nanopatterned sapphire substrate process; photoresist; throughput comparison; Interference; Laser beams; Lithography; Mathematical model; Resists; Substrates; Throughput; Nano-pattern sapphire substrate; Pattern sapphire substrate; laser interference lithography;
Conference_Titel :
Nano/Micro Engineered and Molecular Systems (NEMS), 2014 9th IEEE International Conference on
Conference_Location :
Waikiki Beach, HI
DOI :
10.1109/NEMS.2014.6908873
