Self-assembly of colloid nano particle by evaporation-induced method

This paper presents a self-assembled method to fabricate the colloid nanoparticle monolayer based on the evaporation-induced process. The effects of environmental factors on the experimental result have been systematically investigated. After the optimization of the process parameters, the colloid nanoparticle monolayer was achieved with the assistance of PDMS template on the silicon substrate. Following by reactive ion etching process, this simple ordering technique can be utilized to form different patterns for monolayer and bilayers. Hexagon-ordered, high-aspect-ratio silicon nanowires have been fabricated by using pre-ordered nanoparticles as masks in the DRIE procedure. This simple and universal method has potential applications in micro/nano systems, especially for sensors, transistors and photovoltaic devices, etc.