DocumentCode
2528959
Title
Field emission diodes using sharp vertical edge structure
Author
Zurn, S.M. ; Schiller, P.J. ; Glumac, D.E. ; Mei, Q. ; Polla, D.L.
Author_Institution
Dept. of Electr. Eng., Minnesota Univ., Minneapolis, MN, USA
fYear
1994
fDate
11-14 Dec. 1994
Firstpage
27
Lastpage
30
Abstract
Field emission diodes with sharp vertical edges have been fabricated for possible future cathodoluminescence and high frequency device applications. These devices are formed using self-aligned planar processing methods based on conformal thin film deposition techniques thereby eliminating many of the fabrication difficulty and performance variation associated with other previously used fabrication methods. Recessed sealed vacuum cavities have been formed as part thereby eliminating the need for external vacuum pumping.<>
Keywords
cathodes; cathodoluminescence; diodes; electron field emission; semiconductor technology; vacuum microelectronics; Au; Si; cathodoluminescence devices; cold cathode microdiodes; conformal thin film deposition; fabrication; field emission diodes; high frequency device applications; recessed sealed vacuum cavities; self-aligned planar processing methods; sharp vertical edge structure; Anodes; Diodes; Electrodes; Electron emission; Glass; Gold; Microelectronics; Vacuum systems; Vacuum technology; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1994. IEDM '94. Technical Digest., International
Conference_Location
San Francisco, CA, USA
ISSN
0163-1918
Print_ISBN
0-7803-2111-1
Type
conf
DOI
10.1109/IEDM.1994.383473
Filename
383473
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