• DocumentCode
    2528959
  • Title

    Field emission diodes using sharp vertical edge structure

  • Author

    Zurn, S.M. ; Schiller, P.J. ; Glumac, D.E. ; Mei, Q. ; Polla, D.L.

  • Author_Institution
    Dept. of Electr. Eng., Minnesota Univ., Minneapolis, MN, USA
  • fYear
    1994
  • fDate
    11-14 Dec. 1994
  • Firstpage
    27
  • Lastpage
    30
  • Abstract
    Field emission diodes with sharp vertical edges have been fabricated for possible future cathodoluminescence and high frequency device applications. These devices are formed using self-aligned planar processing methods based on conformal thin film deposition techniques thereby eliminating many of the fabrication difficulty and performance variation associated with other previously used fabrication methods. Recessed sealed vacuum cavities have been formed as part thereby eliminating the need for external vacuum pumping.<>
  • Keywords
    cathodes; cathodoluminescence; diodes; electron field emission; semiconductor technology; vacuum microelectronics; Au; Si; cathodoluminescence devices; cold cathode microdiodes; conformal thin film deposition; fabrication; field emission diodes; high frequency device applications; recessed sealed vacuum cavities; self-aligned planar processing methods; sharp vertical edge structure; Anodes; Diodes; Electrodes; Electron emission; Glass; Gold; Microelectronics; Vacuum systems; Vacuum technology; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1994. IEDM '94. Technical Digest., International
  • Conference_Location
    San Francisco, CA, USA
  • ISSN
    0163-1918
  • Print_ISBN
    0-7803-2111-1
  • Type

    conf

  • DOI
    10.1109/IEDM.1994.383473
  • Filename
    383473