DocumentCode :
2528959
Title :
Field emission diodes using sharp vertical edge structure
Author :
Zurn, S.M. ; Schiller, P.J. ; Glumac, D.E. ; Mei, Q. ; Polla, D.L.
Author_Institution :
Dept. of Electr. Eng., Minnesota Univ., Minneapolis, MN, USA
fYear :
1994
fDate :
11-14 Dec. 1994
Firstpage :
27
Lastpage :
30
Abstract :
Field emission diodes with sharp vertical edges have been fabricated for possible future cathodoluminescence and high frequency device applications. These devices are formed using self-aligned planar processing methods based on conformal thin film deposition techniques thereby eliminating many of the fabrication difficulty and performance variation associated with other previously used fabrication methods. Recessed sealed vacuum cavities have been formed as part thereby eliminating the need for external vacuum pumping.<>
Keywords :
cathodes; cathodoluminescence; diodes; electron field emission; semiconductor technology; vacuum microelectronics; Au; Si; cathodoluminescence devices; cold cathode microdiodes; conformal thin film deposition; fabrication; field emission diodes; high frequency device applications; recessed sealed vacuum cavities; self-aligned planar processing methods; sharp vertical edge structure; Anodes; Diodes; Electrodes; Electron emission; Glass; Gold; Microelectronics; Vacuum systems; Vacuum technology; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1994. IEDM '94. Technical Digest., International
Conference_Location :
San Francisco, CA, USA
ISSN :
0163-1918
Print_ISBN :
0-7803-2111-1
Type :
conf
DOI :
10.1109/IEDM.1994.383473
Filename :
383473
Link To Document :
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