• DocumentCode
    252897
  • Title

    Polymer material grating used on contactless sub-wavelength MEMS physical sensors

  • Author

    Kuo-Chun Tseng ; Te-Hsun Lin ; Modsching, Norbert ; Wei-Leun Fang ; Chien-Chung Fu

  • Author_Institution
    Inst. of Nano Eng. & Microsyst., Nat. Tsing Hua Univ., Hsinchu, Taiwan
  • fYear
    2014
  • fDate
    13-16 April 2014
  • Firstpage
    592
  • Lastpage
    595
  • Abstract
    We will present a novel detecting principle for MEMS physical sensors based on contactless optical property through periodic sub-wavelength gratings formed by polymer material. This approach employs the wire-grid polarizer (WGP) structure which was fabricated by laser interference lithography (LIL) system and inductively coupled plasma (ICP) dry etching method on the silicon substrate. The WGP transform the deflection of the cantilever beam to the P-polarized of the transmitted light (Tp). In this way, we can get high sensitivity sensing signal directly by the photodetector without physical influence in the MEMS structure.
  • Keywords
    etching; lithography; microsensors; photodetectors; cantilever beam; contactless subwavelength MEMS physical sensors; inductively coupled plasma dry etching method; laser interference lithography system; periodic subwavelength gratings; photodetector; polymer material grating; silicon substrate; wire grid polarizer structure; Fabrication; Gratings; Laser beams; Optical sensors; Polymers; Structural beams; Laser Interference Lithography; MEMS physical sensors; Wire-grid polarizer;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nano/Micro Engineered and Molecular Systems (NEMS), 2014 9th IEEE International Conference on
  • Conference_Location
    Waikiki Beach, HI
  • Type

    conf

  • DOI
    10.1109/NEMS.2014.6908881
  • Filename
    6908881