DocumentCode
252897
Title
Polymer material grating used on contactless sub-wavelength MEMS physical sensors
Author
Kuo-Chun Tseng ; Te-Hsun Lin ; Modsching, Norbert ; Wei-Leun Fang ; Chien-Chung Fu
Author_Institution
Inst. of Nano Eng. & Microsyst., Nat. Tsing Hua Univ., Hsinchu, Taiwan
fYear
2014
fDate
13-16 April 2014
Firstpage
592
Lastpage
595
Abstract
We will present a novel detecting principle for MEMS physical sensors based on contactless optical property through periodic sub-wavelength gratings formed by polymer material. This approach employs the wire-grid polarizer (WGP) structure which was fabricated by laser interference lithography (LIL) system and inductively coupled plasma (ICP) dry etching method on the silicon substrate. The WGP transform the deflection of the cantilever beam to the P-polarized of the transmitted light (Tp). In this way, we can get high sensitivity sensing signal directly by the photodetector without physical influence in the MEMS structure.
Keywords
etching; lithography; microsensors; photodetectors; cantilever beam; contactless subwavelength MEMS physical sensors; inductively coupled plasma dry etching method; laser interference lithography system; periodic subwavelength gratings; photodetector; polymer material grating; silicon substrate; wire grid polarizer structure; Fabrication; Gratings; Laser beams; Optical sensors; Polymers; Structural beams; Laser Interference Lithography; MEMS physical sensors; Wire-grid polarizer;
fLanguage
English
Publisher
ieee
Conference_Titel
Nano/Micro Engineered and Molecular Systems (NEMS), 2014 9th IEEE International Conference on
Conference_Location
Waikiki Beach, HI
Type
conf
DOI
10.1109/NEMS.2014.6908881
Filename
6908881
Link To Document