Title :
Polymer material grating used on contactless sub-wavelength MEMS physical sensors
Author :
Kuo-Chun Tseng ; Te-Hsun Lin ; Modsching, Norbert ; Wei-Leun Fang ; Chien-Chung Fu
Author_Institution :
Inst. of Nano Eng. & Microsyst., Nat. Tsing Hua Univ., Hsinchu, Taiwan
Abstract :
We will present a novel detecting principle for MEMS physical sensors based on contactless optical property through periodic sub-wavelength gratings formed by polymer material. This approach employs the wire-grid polarizer (WGP) structure which was fabricated by laser interference lithography (LIL) system and inductively coupled plasma (ICP) dry etching method on the silicon substrate. The WGP transform the deflection of the cantilever beam to the P-polarized of the transmitted light (Tp). In this way, we can get high sensitivity sensing signal directly by the photodetector without physical influence in the MEMS structure.
Keywords :
etching; lithography; microsensors; photodetectors; cantilever beam; contactless subwavelength MEMS physical sensors; inductively coupled plasma dry etching method; laser interference lithography system; periodic subwavelength gratings; photodetector; polymer material grating; silicon substrate; wire grid polarizer structure; Fabrication; Gratings; Laser beams; Optical sensors; Polymers; Structural beams; Laser Interference Lithography; MEMS physical sensors; Wire-grid polarizer;
Conference_Titel :
Nano/Micro Engineered and Molecular Systems (NEMS), 2014 9th IEEE International Conference on
Conference_Location :
Waikiki Beach, HI
DOI :
10.1109/NEMS.2014.6908881