DocumentCode :
2530809
Title :
Effect of fringing fields on subthreshold surface potential of channel engineered short channel MOSFETs
Author :
Sarkar, Angsuman ; De, Swapnadip ; Nagarajan, Mohankumar ; Sarkar, C.K. ; Baishya, S.
Author_Institution :
ECE Dept., Jalpaiguri Govt. Eng. Coll., Jalpaiguri
fYear :
2008
fDate :
19-21 Nov. 2008
Firstpage :
1
Lastpage :
6
Abstract :
An analytical and accurate subthreshold surface potential model for short channel Conventional, LAC & double halo including the effect of inner fringing field is presented, considering the surface potential variation with the depth of the channel depletion layer. With this the drawback of existing models, the assumption of a constant channel depletion layer thickness is removed. A pseudo two dimensional method is adopted and we report a more accurate prediction of the surface potential including the fringing field effect.
Keywords :
MOSFET; channel depletion layer; channel engineered short channel MOSFET; fringing field effect; pseudo two dimensional method; subthreshold surface potential; CMOS technology; Dielectric devices; Electrodes; Gaussian channels; Integrated circuit technology; Los Angeles Council; MOSFETs; Parasitic capacitance; Poisson equations; Postal services; Double Halo implant; Inner Fringing Field; LAC; Pseudo 2-D analysis; Surface Potential;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
TENCON 2008 - 2008 IEEE Region 10 Conference
Conference_Location :
Hyderabad
Print_ISBN :
978-1-4244-2408-5
Electronic_ISBN :
978-1-4244-2409-2
Type :
conf
DOI :
10.1109/TENCON.2008.4766741
Filename :
4766741
Link To Document :
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