Functionalization of nanoscaled 2 nm-thick ALD-HfO2 layer by rapid thermal annealing and CF4 plasma for LAPS NH4+ detection

In this work, discussing the detection of NH₄⁺ ion based on LAPS with functionalized 2 nm-thick ALD-HfO₂ film using RTA and CF₄ plasma is demonstrated. The annealing treatment at 500, 700, and 900°C were performed on ALD-HfO₂ film and the plasma treatment for 1, 3, and 5 min were performed on ALD-HfO₂ film with 900°C annealing. In the results, the response for NH₄⁺ ion detection was decreased with increasing annealing temperature and increased with increasing plasma time. The optimum sensitivity of 37.28mV/pNH₄ was achieved with 900°C annealing and 5 min CF₄ plasma.