DocumentCode
2532231
Title
Why is the spin field effect transistor elusive?
Author
Pramanik, Sandipan ; Bandyopadhyay, Supriyo ; Cahay, Marc
Author_Institution
Dept. of Electr. Eng., Virginia Commonwealth Univ., Richmond, VA, USA
fYear
2004
fDate
16-19 Aug. 2004
Firstpage
101
Lastpage
103
Abstract
The primary obstacle to the realization of the spin field effect transistor was thought to be the difficulty of spin injection from a ferromagnetic contact into a semiconductor channel. While this remains a major roadblock, there are other obstacles that are equally daunting. One overlooked fact is that the ferromagnetic contacts cause a magnetic field in the transistor´s channel, which introduces a new kind of spin relaxation mechanism. This allows even non-magnetic impurities (with symmetric or asymmetric scattering potential) to flip spin. Another overlooked fact is that if the contacts are reflective, then multiple reflections of carriers between the contacts gives rise to Ramsauer resonances at low temperatures which could affect transistor operation and make transistor characteristics particularly sensitive to impurities in the channel. Finally, the channel must be quasi one-dimensional to mitigate the harmful effect of ensemble averaging and D´yakonov-Perel´ relaxation. Taking into consideration all of this, we have designed a structure that may be promising.
Keywords
field effect transistors; magnetoelectronics; semiconductor device models; D´yakonov-Perel´ relaxation; Ramsauer resonances; asymmetric scattering potential; ensemble averaging; multiple carrier reflection; nonmagnetic impurities; quasione-dimensional channel; spin field effect transistor; spin flipping; spin relaxation mechanism; symmetric scattering potential; transistor channel; Electrons; FETs; Gallium arsenide; Magnetoelectronics; Resonance; Semiconductivity; Semiconductor impurities; Spin polarized transport; Temperature dependence; Threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology, 2004. 4th IEEE Conference on
Print_ISBN
0-7803-8536-5
Type
conf
DOI
10.1109/NANO.2004.1392263
Filename
1392263
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