Title :
Fabrication of the multi-PCR chamber with inner heat-sink materials using a micro-blaster etching technique
Author :
Park, Hyoung-Jin ; Eun, Duk-Soo ; Kong, Dae-Young ; Kong, Seong-Jin ; Kong, Seong-Ho ; Shin, Jang-Kyoo ; Lee, Jong-Hyun
Author_Institution :
Sch. of Electron. & Electr. Eng., Kyungpook Nat. Univ., Taegu, South Korea
Abstract :
In this paper, we propose a new design for a PCR (polymerase chain reaction) chamber with a temperature sensor under a top glass wafer and heaters on the bottom glass wafer. These chamber sensors are thermally isolated from the heater. The multi PCR chamber has an inner heat-sink material of etched silicon mass or glass mass using a micro-blaster. Then we will capture the image of the thermal mass temperature profile among the chambers by using the TIS (thermal imaging system). The performance of the inner heat-sink materials is analyzed during the PCR cycles and the thermal interference of the chamber, respectively.
Keywords :
chemical reactors; etching; heat sinks; infrared imaging; polymers; temperature sensors; Si; bottom glass wafers; chamber sensors; etched glass mass; etched silicon mass; heaters; inner heat-sink materials; microblaster; microblaster etching technique; multipolymerase chain reaction chamber fabrication; temperature sensors; thermal imaging system; thermal mass temperature profile; top glass wafers; Fabrication; Glass; Lamination; Micromechanical devices; Polymers; Resists; Silicon; Sputter etching; Substrates; Wafer bonding;
Conference_Titel :
MEMS, NANO and Smart Systems, 2005. Proceedings. 2005 International Conference on
Print_ISBN :
0-7695-2398-6
DOI :
10.1109/ICMENS.2005.49