DocumentCode :
2533522
Title :
Novel buckled shapes of free-standing mesoscopic beams
Author :
Carr, S.M. ; Lawrence, Walter E. ; Wybourne, Martin N.
Author_Institution :
Dept. of Phys. & Astron., Dartmouth Coll., Hanover, NH, USA
fYear :
2004
fDate :
16-19 Aug. 2004
Firstpage :
267
Lastpage :
269
Abstract :
We discuss the observation of novel buckled shapes of free-standing mesoscopic beams fabricated using conventional electron-beam lithography and plasma etching. As the length-to-width aspect ratio of the beams is increased the buckled shapes become more complex. Based on analysis of beams in the low aspect ratio regime using a nonlinear elastic continuum model, we obtain an upper bound on the magnitude of the fundamental mode asymmetry and relate this to higher-order asymmetry. We also observe an electromechanical mode-mode transition using capacitively coupled gates.
Keywords :
beams (structures); buckling; continuum mechanics; elasticity; electromechanical effects; electron beam lithography; micromechanical devices; nanotechnology; silicon compounds; sputter etching; Si; SiO2; buckled shapes; capacitive coupled gates; electromechanical mode-mode transition; electron-beam lithography; free-standing mesoscopic beams; fundamental mode asymmetry; higher-order asymmetry; length-width aspect ratio; low aspect ratio regime; nonlinear elastic continuum model; plasma etching; Astronomy; Capacitive sensors; Etching; Lithography; Particle beams; Physics; Plasma applications; Shape; Silicon; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology, 2004. 4th IEEE Conference on
Print_ISBN :
0-7803-8536-5
Type :
conf
DOI :
10.1109/NANO.2004.1392319
Filename :
1392319
Link To Document :
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