Continuous photolithography system and technology for fiber substrate

Author

Zhang, Y. ; Lu, J. ; Ohtomo, A. ; Mekaru, H. ; Itoh, T.

Author_Institution

NEDO BEANS Project, Macro BEANS Center, Tsukuba, Japan

fYear

2011

fDate

5-9 June 2011

Firstpage

370

Lastpage

373

Abstract

This paper presents novel continuous photolithography technology and system as well for fiber substrate. The newly-developed system mainly consists of spray coating and three-dimensional (3D) UV exposure units. Thin and uniform resist film is successfully prepared on fiber substrates and thus the photolithography results were improved much. It is noteworthy that thin resist film could be formed on 125 μm-in-diameter fiber even without rotation, suggesting that the spray coating technology has attractive prospects. With the 3D photolithography system, fine patterns of resist down to 20 μm line width are successfully formed on the 125 μm-in-diameter fiber.

Keywords

photolithography; spray coating techniques; 3D UV exposure units; 3D photolithography system; continuous photolithography system; fiber substrate; size 125 mum; spray coating technology; three-dimensional UV exposure units; Films; Lithography; Optical fiber communication; Optical fiber sensors; Optical fibers; Resists; Substrates; Fiber MEMS; Photolithography; Surface machining;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Sensors, Actuators and Microsystems Conference (TRANSDUCERS), 2011 16th International

Conference_Location

Beijing

ISSN

Pending

Print_ISBN

978-1-4577-0157-3

Type

conf

DOI

10.1109/TRANSDUCERS.2011.5969476

Filename

5969476