Title :
Continuous photolithography system and technology for fiber substrate
Author :
Zhang, Y. ; Lu, J. ; Ohtomo, A. ; Mekaru, H. ; Itoh, T.
Author_Institution :
NEDO BEANS Project, Macro BEANS Center, Tsukuba, Japan
Abstract :
This paper presents novel continuous photolithography technology and system as well for fiber substrate. The newly-developed system mainly consists of spray coating and three-dimensional (3D) UV exposure units. Thin and uniform resist film is successfully prepared on fiber substrates and thus the photolithography results were improved much. It is noteworthy that thin resist film could be formed on 125 μm-in-diameter fiber even without rotation, suggesting that the spray coating technology has attractive prospects. With the 3D photolithography system, fine patterns of resist down to 20 μm line width are successfully formed on the 125 μm-in-diameter fiber.
Keywords :
photolithography; spray coating techniques; 3D UV exposure units; 3D photolithography system; continuous photolithography system; fiber substrate; size 125 mum; spray coating technology; three-dimensional UV exposure units; Films; Lithography; Optical fiber communication; Optical fiber sensors; Optical fibers; Resists; Substrates; Fiber MEMS; Photolithography; Surface machining;
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems Conference (TRANSDUCERS), 2011 16th International
Conference_Location :
Beijing
Print_ISBN :
978-1-4577-0157-3
DOI :
10.1109/TRANSDUCERS.2011.5969476
